Key Dates
May or June, 2022
Date
March, 2022
Abstract Submission Deadline
May or June, 2022
Online Registration Deadline
May or June, 2022
On-site Registration Dates

Registration/注册

Xiaobin Xu

报告题目:

Scalable Nanopatterning Methods and Their Biomedical Applications

报告人:

Xiaobin Xu

所在单位:

Tongji University

Biography:Xiaobin Xu is a Professor in the School of Materials Science and Engineering at Tongji University in China. He received his bachelor’s (2003) and master’s degrees (2007) from Zhejiang University, and doctorate (2014) degree from The University of Texas at Austin (with Prof. Donglei Fan). Then Dr. Xu joined Prof. Paul S. Weiss’s group in University of California Los Angeles as a postdoctoral scholar (2015-2018). His research focuses on development of new nanopatterning and their applications in electronics, optics, and biomedical devices. He was a receipt of MRS Graduate Student Award in 2014. He now serves as an associate editor for Bio-Design and Manufacturing.



Abstract
Conventional photolithography, due to its scalability, robustness, and straightforward processes, has been widely applied to micro- and nanostructure manufacturing in electronics, optics, and biology. However, optical diffraction limits the ultimate resolution of conventional photolithography, which hinders its potential in nanoscale patterning for broader applications. To achieve high-throughput nanoscale pattering at low-cost for biomedical applications, we developed a series of robust patterning approaches. For examples: 1) polymer-pen chemical lift-off lithography, which can achieve sub-50 nm molecular patterning, 2) multiple-patterning nanosphere lithography (MP-NSL), which can be used for the fabrication of periodic 3D hierarchical nanostructures in a highly scalable and tunable manner. Large area, periodic, vertically aligned Si nanotubes with nanometer-scale control in three dimensions including outer/inner diameters, heights/hole-depths, and pitches have been fabricated. 3) recently developed dual-layer photolithography (DLPL) for sub-micron patterning. Which is based on controlled exposure and development of overlapping positive and negative photoresists. Their applications in FET biosensors, plasmonic biosensors, photoelectric sensors, DNA sensors, and intracellular delivery will be presented.