Key Dates
December 5-6, 2021
Date
October 25, 2021
Abstract Submission Deadline
December 6, 2021
Online Registration Deadline
December 4, 2021
On-site Registration Dates

Registration

Xiaobin Xu

Biography:Xiaobin Xu is a Professor in the School of Materials Science and Engineering at Tongji University in China. He received his bachelor’s (2003) and master’s degrees (2007) from Zhejiang University, and doctorate (2014) degree from The University of Texas at Austin (with Prof. Donglei Fan). Then Dr. Xu joined Prof. Paul S. Weiss’s group in University of California Los Angeles as a postdoctoral scholar (2015-2018). His research focuses on development of new nanopatterning and their applications in electronics, optics, and biomedical devices. He was a receipt of MRS Graduate Student Award in 2014. He now serves as an associate editor for Bio-Design and Manufacturing.


Topic title:
Scalable Nanopatterning Methods and Their Biomedical Applications

Abstract
Conventional photolithography, due to its scalability, robustness, and straightforward processes, has been widely applied to micro- and nanostructure manufacturing in electronics, optics, and biology. However, optical diffraction limits the ultimate resolution of conventional photolithography, which hinders its potential in nanoscale patterning for broader applications. To achieve high-throughput nanoscale pattering at low-cost for biomedical applications, we developed a series of robust patterning approaches. For examples: 1) polymer-pen chemical lift-off lithography, which can achieve sub-50 nm molecular patterning, 2) multiple-patterning nanosphere lithography (MP-NSL), which can be used for the fabrication of periodic 3D hierarchical nanostructures in a highly scalable and tunable manner. Large area, periodic, vertically aligned Si nanotubes with nanometer-scale control in three dimensions including outer/inner diameters, heights/hole-depths, and pitches have been fabricated. 3) recently developed dual-layer photolithography (DLPL) for sub-micron patterning. Which is based on controlled exposure and development of overlapping positive and negative photoresists. Their applications in FET biosensors, plasmonic biosensors, photoelectric sensors, DNA sensors, and intracellular delivery will be presented.